JetStep G45 系(xi)(xi)(xi)(xi)統(tong)(tong)可(ke)(ke)滿足移(yi)動(dong)顯(xian)示行業的(de)(de)苛刻要(yao)求。該(gai)系(xi)(xi)(xi)(xi)統(tong)(tong)基于(yu)成熟的(de)(de)步進技(ji)術,將優(you)化(hua)的(de)(de)性能(neng)與(yu)良好的(de)(de)擁有(you)成本(ben)相結(jie)合。JetStep G45 系(xi)(xi)(xi)(xi)統(tong)(tong)在 >200mm 的(de)(de)視(shi)場直徑范(fan)圍內具有(you) <1.5μm 的(de)(de)分辨(bian)率能(neng)力。低(di)(di)(di)(di)失真光(guang)學結(jie)合高速運(yun)(yun)動(dong)使(shi)系(xi)(xi)(xi)(xi)統(tong)(tong)能(neng)夠(gou)實現<0.5μm的(de)(de)覆(fu)蓋。JetStep G45 系(xi)(xi)(xi)(xi)統(tong)(tong)放大光(guang)學器件(jian)允許(xu)使(shi)用 6 英(ying)寸(cun)標(biao)線片(pian)(掩模(mo)),與(yu)競爭技(ji)術相比,顯(xian)著降(jiang)低(di)(di)(di)(di)了加工(gong)成本(ben)。此外,該(gai)系(xi)(xi)(xi)(xi)統(tong)(tong)占地(di)面(mian)積小(xiao),可(ke)(ke)大限度地(di)降(jiang)低(di)(di)(di)(di)設施(shi)成本(ben),其無摩(mo)擦運(yun)(yun)動(dong)可(ke)(ke)減少磨損,從而降(jiang)低(di)(di)(di)(di)維護成本(ben)。綜合節省導致成本(ben)低(di)(di)(di)(di)廉(lian)的(de)(de)制造(zao)過(guo)程,降(jiang)低(di)(di)(di)(di)了資(zi)本(ben)支(zhi)出和擁有(you)成本(ben) (COO)。